Microstructure and Properties of TiO2 Thin Films Doped with Ni.pdfVIP

Advanced Materials Research Vols. 490-495 (2012) pp 3306-3310 Online available since 2012/Mar/15 at © (2012) Trans Tech Publications, Switzerland doi:10.4028//AMR.490-495.3306 Microstructure and properties of TiO thin films doped with Ni 2 Fei Gao1,a, Xiaoyan Liu1,b, Liyun Zheng1,c, Meixia Li1,d, Ruijiao Jiang1,e College of equipment manufacture, Hebei University of Engineering, Handan 056038, China a b c g123f@126.com (corresponding author), x918y@126.com, zhengliyun@126.com, d e xxllmx@163.com, 564866358@ Keywords: TiO thin film; microstructure; optical property; photocatalysis property. 2 Abstract. TiO and Ni-doped TiO thin films were prepared by DC magnetron sputtering. The 2 2 effects of Ni-doping on the microstructure and properties were studied by atomic force microscopy (AFM), X-ray diffraction (XRD), UV-Vis spectra and photocatalysis tesing, respectively. The results show that TiO thin films were successfully prepared with smooth surface. When doped with 2 Ni, the surface of TiO thin film was improved and the growth of anatase phase was also promoted. 2 With increasing the sputtering power of Ni, the absorption edge wavelegth red shifted and the photocatalysis property of TiO2 thin films was increased and then decreased. Instruction TiO is the most potential photocatalyst because of its stable chemistry properties, non - toxic and 2 low cost [1,2,3]. In order to enhance the photocatalysis properties of TiO , some methods