IC工艺8new分析.pptVIP

* * 已知 、NA及k值，计算分辨率和焦深 ????? 2(NA)2 DOF = Photoresist Film Depth of focus Center of focus + - Lens, NA Wafer Mask Illuminator, ? DOF ????? ?? ???R DOF 365 nm 0.45 486 nm 901 nm 365 nm 0.60 365 nm 507 nm 193 nm 0.45 257 nm 476 nm 193 nm 0.60 193 nm 268 nm i-line DUV k????? NA R = * * Optical Lithography Image of circuit patterns projected onto wafer Feature size limited by diffraction effects Rayleigh limits Resolution Depth of focus q Mask Silicon Wafer Illumination (Wavelength l) Numerical Aperture: * * 250 180 130 100 70 50 * * 总的说来，光刻指的是将图形转移到一个平面的任一复制过程，是