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纳米级压印光刻技术模具变形中的应用
第一部分是英语原文,第二部分是译文,因为很多名词不大会所以让你读得有些奇怪,不知道能不能帮上忙。
Mold deformation in nanoimprint lithographyF. Lazzarino,a) C. Gourgon, P. Schiavone, and C. PerretLaboratoire des Technologies de la Microélectronique, CNRS, c/o CEA, Grenoble, 17 Rue des Martyrs, 38054 Grenoble Cedex 9, France(Received 21 June 2004; accepted 20 September 2004; published 13 December 2004)In nanoimprint lithography (NIL), one of the key points to be addressed is the printing uniformityon large area. During the process, the silicon mold undergoes signi?cant mechanical stress ofdifferent kinds (tension, compression, ?e
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