Maryam.pptVIP

* Atomic Layer Deposition (ALD) Maryam Ebrahimi University of Waterloo January 17th, 2006 Chem 750/7530 * Outline ALD Theory and Process Precursor Requirements Deposition Advantages Comparison to CVD Process Applications * What is ALD? ALD (Atomic Layer Deposition) Deposition method by which precursor gases or vapors are alternately pulsed on to the substrate surface. Precursor gases introduced on to the substrate surface will chemisorb or surface reaction takes place at the surface Surface reactions on ALD are complementarity and self-limiting * ALD Example Cycle for Al2O3 Deposition In air