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* * * * * * * * * 几种常用的电阻1 * 几种常用的电阻2 * 几种常用的电阻3 * 实例1(高压MOS晶体管) 西安电子科技大学 * 实例2(CMOS逻辑电路) 西安电子科技大学 * Thanks! 西安电子科技大学 Wafer Fabrication Process Technology CMOS CSMC * Content 0.5um CMOS (LDD) process flow cross section LDD=lightly doping drain CMOS Starting with a silicon wafer Cross Section of the Silicon Wafer Magnifying the Cross Section CMOS n/p-well Formation Grow Thin Oxide Deposit Nitride Deposit Resist silicon substrate UV Exposure Develop Resist Etch Nitride n-well Implant Remove Resist CMOS n/p-well Formation silicon substrate Grow Oxide (n-well) Remove Nitride p-well Implant Remo
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