A robust method to determine the contact resistance using the van der Pauw set up.pdfVIP

A robust method to determine the contact resistance using the van der Pauw set up.pdf

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A robust method to determine the contact resistance using the van der Pauw set up.pdf

Measurement 98 (2017) 151–158 Contents lists available at ScienceDirect Measurement journal homepage: /locate/measurement A robust method to determine the contact resistance using the van der Pauw set up G. González-Díaz ?, D. Pastor, E. García-Hemme, D. Montero, R. García-Hernansanz, J. Olea, A. del Prado, E. San Andrés, I. Mártil Dept. de Física Aplicada III (Electricidad y Electrónica), Univ. Complutense de Madrid, 28040 Madrid, Spain CEI Campus Moncloa, UCM-UPM, 28040 Madrid, Spain article info Article history: Received 6 October 2016 Received in revised form 23 November 2016 Accepted 24 November 2016 Available online 25 November 2016 Keywords: van der Pauw Sheet resistance Contacts Resistivity PSPICE abstract The van der Pauw method to calculate the sheet resistance and the mobility of a semiconductor is a pervasive technique both in the microelectronics industry and in the condensed matter science ?eld. There are hundreds of papers dealing with the in?uence of the contact size, non-uniformities and other second order effects. In this paper we will develop a simple methodology to evaluate the error produced by ?nite size contacts, detect the presence of contact resistance, calculate it for each contact, and determine the linear or rectifying behavior of the contact. We will also calculate the errors produced by the use of voltmeters with ?nite input resistance in relation with the sample sheet resistance. ó 2016 Elsevier Ltd. All rights reserved. 1. Introduction The four-point probe measuring technique is very well known from the beginning of the XX century when Wenner proposed it to measure the earth resistivity [1]. Later Valdes [2] adapted it for semiconductor measurements. The collinear four-point probe has been of great importance for the microelectronic industry. The determination of implantation uniformity over the whole wafer is an example. The method undergoes an important change with the famous paper by van der Pauw [3] where the author solved the pro

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