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深宽比图形表面涂胶-喷胶工艺解决方案
? KINGSEMI is founded by Shenyang Institute of Automation Chinese
Academy of Sciences in 2002.
? The current number of employees is 140 people, including 67 technician.
? Head office is located in Hunnan New District, Shenyang; branch offices
are located in Shanghai, Jiangsu, Wuhan, and Wuhu.
? For professional semiconductor and LED wafer process equipment
research and development, manufacturing, sales, and after-sales service.
KINGSEMI OVERVIEW
KINGSEMI—Processing Equipment
12″ 8″ Spray coater 12″ 8″ Coater Developer
12″ 8″ Wet
etching equipment
Mask coater Hot plateSemi-auto
12″ 8″ Photoresist
stripping
12″ 8″Scrubber
KS-S300-SP Spray Coater
?Atomizing Photoresist
?For coating through-hole/unsmooth wafer surface
?For TSV、MEMS、WLP processing
Spray Coater Challenge
Goal: Uniform PR film
PR film tends to tear
at the top edges
Limited control of PR
thickness at the bottom
of the topography
Spray Coater Theory
X-Stage
Y-StageHeated Chuck
Path
Nozzle1
2
3
4
1st Layer
Rotate
90°
2nd Layer
Rotate
90°
3rd Layer
Rotate
90°
4th Layer
Spray coater—atomizing nozzle
Operating frequency:
120KHz
Maximum flow rate:
0.35gph
Median drop
diameter: 18μ
Spray coating processing
performance
Unpatterned wafer; Thickness : 3.5um; Uniformity:+/-1.9%
Spray coating processing performance
T1 T2
T3
T4
T5
500um
Goal
(μm)
Result
(μm)
T1 10±1 10.54
T2 5~10 7.67
T3 10±1 9.45
T4 10~15 13.55
T5 10±1 11.25
APPLICATION: KOH TOPOGRAPHY + AZ4999
Spray coating processing performance
W : 60um
D : 120um
KS-S300 Coater Developer
?Unique coater unit, eliminating “Cotton Candy” issue in coater unit.
?Temperature gradient controlled by gradual baking process.
?For super thick photoresist coating, developing and baking process.
KS-S300-E Single wafer wet etching equipment
?Unique Bernoulli clamping technology, with protection
function on the wafer back.
?Capable to spray multiple chemicals in the same
chamber, and recycle the chemicals.
Sales Manger: qiugb@
Mobile Ph
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