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? KINGSEMI is founded by Shenyang Institute of Automation Chinese Academy of Sciences in 2002. ? The current number of employees is 140 people, including 67 technician. ? Head office is located in Hunnan New District, Shenyang; branch offices are located in Shanghai, Jiangsu, Wuhan, and Wuhu. ? For professional semiconductor and LED wafer process equipment research and development, manufacturing, sales, and after-sales service. KINGSEMI OVERVIEW KINGSEMI—Processing Equipment 12″ 8″ Spray coater 12″ 8″ Coater Developer 12″ 8″ Wet etching equipment Mask coater Hot plateSemi-auto 12″ 8″ Photoresist stripping 12″ 8″Scrubber KS-S300-SP Spray Coater ?Atomizing Photoresist ?For coating through-hole/unsmooth wafer surface ?For TSV、MEMS、WLP processing Spray Coater Challenge Goal: Uniform PR film PR film tends to tear at the top edges Limited control of PR thickness at the bottom of the topography Spray Coater Theory X-Stage Y-StageHeated Chuck Path Nozzle1 2 3 4 1st Layer Rotate 90° 2nd Layer Rotate 90° 3rd Layer Rotate 90° 4th Layer Spray coater—atomizing nozzle Operating frequency: 120KHz Maximum flow rate: 0.35gph Median drop diameter: 18μ Spray coating processing performance Unpatterned wafer; Thickness : 3.5um; Uniformity：+/-1.9% Spray coating processing performance T1 T2 T3 T4 T5 500um Goal （μm） Result （μm） T1 10±1 10.54 T2 5～10 7.67 T3 10±1 9.45 T4 10～15 13.55 T5 10±1 11.25 APPLICATION: KOH TOPOGRAPHY + AZ4999 Spray coating processing performance W : 60um D : 120um KS-S300 Coater Developer ?Unique coater unit, eliminating “Cotton Candy” issue in coater unit. ?Temperature gradient controlled by gradual baking process. ?For super thick photoresist coating, developing and baking process. KS-S300-E Single wafer wet etching equipment ?Unique Bernoulli clamping technology, with protection function on the wafer back. ?Capable to spray multiple chemicals in the same chamber, and recycle the chemicals. Sales Manger: qiugb@ Mobile Ph