钨基半导体光催化剂研究进展详解.pdfVIP

第 6 卷 第 5 期 有色金属科学与工程 Vol.6，No.5 2 0 1 5 年 10 月 Nonferrous Metals Science and Engineering Oct. 2015 文章编号：1674-9669（2015）05-0032-08 DOI：10.13264/ki.ysjskx.2015.05.007 钨基半导体光催化剂研究进展 何洪波， 薛霜霜， 余长林 （江西理工大学冶金与化学工程学院，江西 赣州 341000） 摘 要：钨基半导体材料作为光催化剂通常具有较小禁带宽度，能吸收可见光，可表现较好的光催化 活性，近年来引起了人们的广泛关注.另外它们的结构、形貌和比表面积可以根据不同的合成方法进 行调控.阐述近年来发展的氧化钨、钨酸盐、掺杂钨酸盐，以及复合钨酸盐等典型钨基半导体光催化材 料研究进展.着重从光催化原理、形貌控制、比表面积及能隙调节等方面分析结构和光催化性能的关 系，并在此基础上对钨基半导体光催化剂的发展和研究方向进行展望. 关键词：钨基半导体光催化剂；可见光；光催化性能；研究进展 中图分类号：O643；TF125.24 文献标志码：A Recent development of W-based semiconductor photocatalyts HE Hongbo, XUE Shuangshuang, YU Changlin （School of Metallurgy and Chemical Engineering, Jiangxi University of Science and Technology, Ganzhou 341000, China） Abstract：W-based semiconductor materials usually have small energy gap and display good visible light ab - sorption and high photocatalytic activity, which have attracted much attention recently. Moreover, their struc - ture, morphology, and surface area can be regulated easily by different synthesis methods. This paper summa - rizes recent research progress of W -based semiconductor photocatalyts, including tungsten oxide, tungstate, doped tungstate, composites and etc. The relationships between structure and photocatalytic performance are analyzed from the view of photocatalytic principle, morphology, specific surface area and energy gap. Finally, the research direction and prospect of W-based semiconductor photocatalyts are suggested. Key words：W-based semiconductor; photocatalyts; visible light; photocatalytic performance; research progress 当前，环境污染是人类社会发展所面临的难题之 可见光吸收好[11]、催化活性高[12-13]和性能稳定[14]等优点. 一. 半导体光催化技术具有室温深度反应和可以直接 本文综述了氧化钨、钨酸盐、掺杂钨酸盐、复合