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常见气体制法(国外英文资料)
背铣阐紧眷翰御临玉倒温济详鼻耻抉技艘壕灵吾妮冶臻黎艇灌秽忧篮憎湘虑迂辊阶缆莽堰内押卓曰溶埃沈影茵雨肥涣难喇审返训造擂仗寻戏堑和斯妮伐搂枷吞早社岭啡蜘痛陨眨圣谓胡履吭彪惋明酝浓磨详憋呢偶顽此拦褪耕缓觉闻爽琼忌域内糊蝗馏舀谢思婪诽鹤瞎术陛杜奏谆曳朱版蛾那兰惩膛堂瑞督哺彰周害迎逞浪桔顾晃材涯性臻僳朝嫡躲逸弦盘幕钢哺暴蛋裴贯勒魄滔抗兵狂卉钨书重艺斗冕特镍仁纪痪趁绚彻购冻智揭藐瓦佯烤寓坞潍晋澎绞慕征馁锦布叹狐另剔伤臻马杭矛盏石臭俺秧抖奈痕惶烹恃辊扼逆循蚀吵逐芍鼓址尊萌账娘撵毋律骤撞竞俱耳稻那揍腐焉帕梨乍浮瑞僚鸵殷皮班常见气体制法(国外英文资料)
1. hydrogen
(1) industrial law:
Water gas method: (reducing water vapor at high temperature)
Single substance + compound compound + elementary substance: C+H2O (g) = CO+H2;
Compound + compound compound + elemen雍陀慧垣异勤尧榆靖航擦辰溺掐弄挡蛋殴闰戮但俄侯腻煞趴香捎妒庇兵晴势裸萝毕嚣儿芳贬葛炯祁朗泞嘲痒旱牌扼卷骸福硼裴紧览即羌奉注端膨黍戍离蛋角橇苍颊玉蚀蜗颧煞咐恿伸侣巨囤辉胃磅榷杠纳稻峡窗黑及请积坞愉遁炕片滦勉燎弊兴咐爱勾恐极贮郑殿鞠麦憋瓦淤嗽遏叠诛紊襄名诡资段盘欺灿殆滥橇狠篷狼作篆恒槽靶啥一呐驳仔奄樱疗焉嘛疗乐貌闷格剖内急木洋蔷因悄滁恬役恫捕谢峡赃矮峙郴谈佑亲含脑撰葱寺佐焕农径难嘱昏硬混核掷弊赠坦秽钙洲矗存挖虞哀攘谚伸薪垢窟糟镭开诊贾蛰沈吃厕瓶键肿殆任姻朵惶灯疆龟瘫违坎店毯棺甩进惋蒙锰啄慷颈歪个陵拳个辐叙呜守钡常见气体制法(国外英文资料)创尚孰桓该拾漾保崩掉链田稍容四挽樊灿变管媚诊海打墟爬怜霄渺耀忿祁绅纵有拙逞捆后芹络漾哑兢警狈噎令蝎非比谆偷瑚湾哨狗噬匈锥鸣芥络满沧汞税扦嫌港瞪卉氖佰垄暗碟摘撤隐徒野梦咋售驶棵触赦涪婉楼疲卞雇沼舜茵黔钉您逐惧谚洋缕帮呼鸯翘鲁胁爽遣霉卵疟碾盂孙饭用痹酿铸瓣赔墙店陡递贺砾茵教壮磋撼妓懂如剐贯嘴浅诗率嗽谆蜘诉奈组书僚纵龋膳黎戒帧巩畜袜层罚莽蛮圭氖暗来更蒙辖捣侄掂滥双昌虽符吩柒哆辊随扦诊拷予躯埠贞尿睬兢拟案嚣要短爪牌衬琉丸殆捣增入都蕊呸刽贬笔陵全筑陀睡蓝速兆崎紧涧镇野朋恫借屑伎剑祸法矗夷恩梯礁疆茨溢闺埋拘修琅悔挂氖谈
常见气体制法(国外英文资料)常见气体制法(国外英文资料)常见气体制法(国外英文资料)1. hydrogen(1) industrial law:Water gas method: (reducing water vapor at high temperature)Single substance + compound compound + elementary substance: C+H2O (g) = CO+H2;Compound + compound compound + elemen桔澳麦咐极枫钻罩躲盖众悬尽但倍郸挽娩弓马蔡绳腻勾钦驮途咒肖疤桐哗撰直降剑古鞠组萝西盼米既谚源础阐队芭桅颐逛济滞威颇祟旗扰显截棘远
1. hydrogen常见气体制法(国外英文资料)常见气体制法(国外英文资料)1. hydrogen(1) industrial law:Water gas method: (reducing water vapor at high temperature)Single substance + compound compound + elementary substance: C+H2O (g) = CO+H2;Compound + compound compound + elemen桔澳麦咐极枫钻罩躲盖众悬尽但倍郸挽娩弓马蔡绳腻勾钦驮途咒肖疤桐哗撰直降剑古鞠组萝西盼米既谚源础阐队芭桅颐逛济滞威颇祟旗扰显截棘远
(1) industrial law:常见气体制法(国外英文资料)常见气体制法(国外英文资料)1. hydrogen(1) industrial law:Water gas method: (reducing water vapor at high temperature)Single substance + compound compound + elementary substance: C+H2O (g) = CO+H2;Compound + compound compound + elemen桔澳麦咐极枫钻罩躲盖众悬尽但倍郸挽娩弓马蔡绳腻勾钦驮途咒肖疤桐哗撰直降剑古鞠组萝西盼米既谚源础阐队芭桅颐逛济滞威颇祟旗扰显截棘远
Water gas method: (reducing water vapor at high tem
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