聚焦离子束仪FIB-工学院.docVIP

聚焦離子束儀FIB 聚焦離子束/電子束顯微技術的原理利用聚焦離子束離子源，。聚焦離子束的基本系統單元包括離子源、離子光學、基板平台和真空腔體，先進的系統中還包含電子束系統與反應氣體注入系統，(Upper Lens)被聚焦與準直成平行的離子束，接著離子束經過質量篩選器(Mass Separator)與漂移管(Drift Tube)，質量篩選器是將不要的荷質比離子過濾，只讓正確的荷質比的Ga+離子通過，下方漂移管裡配有矯正散光的鏡組(Stigmatic Focus Lens)，可以聚焦與準直確保離子垂直的前進，下層鏡組(Lower Lens)接在漂移管之後，用來更進一步聚焦與降低束徑，接著是離子束偏移器(Beam Deflector)用來控制最後離子束聚焦在基板的位置。 二、型號：FEI Helios NanoLab? 600i 規格： Elstar UHR immersion lens FESEM column ? Elstar electron gun with: - Schottky thermal ?eld emitter - Hot-swap capability ? 60 degree dual objective lens with pole piece protection ? Heated objective apertures ? Electrostatic scanning ? ConstantPower? lens technology Electron beam resolution @ optimum WD - 0.8 nm at 30 kV (STEM) - 0.9 nm at 15 kV - 1.4 nm at 1 kV Electron beam resolution @ coincident point - 1.0 nm at 15 kV - 1.6 nm at 5 kV - 2.5 nm at 1 kV Ion beam resolution @ coincident point ? 4.5 nm at 30 kV using preferred statistical method ? 2.5 nm at 30 kV using selective edge Method Landing voltage range ? E-beam: 350 V - 30 kV (50V - 30 kV with Beam Deceleration mode option) ? I-beam: 500 V - 30 kV Probe current ? E-beam: up to 22 nA ? I-beam: 1 pA - 65 nA (15 position aperture strip) High precision 5-axes motorized stage ? XY: 150 mm, piezo-driven ? Z: 10 mm motorized ? T: - 10° to + 60° ? R: n x 360° (endless), piezo-driven ? Tilt accuracy (between 50° to 54°): 0.1° ? X,Y repeatability: 1.0 μm Sample size ? Maximum size: 150 mm diameter with full rotation (larger samples  possible with limited rotation) ? Maximum clearance between stage and coincidence point: 55 mm ? Weight: max. 500 g (including the sample holder 四、典型分析試驗結果： 使用聚焦離子束(FIB)作為觀察影像來源： 圖為電子影像與離子影像比較 五、放置位置：工學院綜合大樓 130室 負責技術人員：賴時盈、陳學人