靶电流对Cr-C-N薄膜机械性质影响之研究.PDFVIP

靶電流對 Cr-C-N 薄膜機械性質影響之研究 楊玉森 1† 葉瀚文 1‡ 林嘉豪 2‡ 1 國立高雄第一科技大學機械與自動化工程系 2 國立高雄第一科技大學工程科技研究所 摘要 本研究利用反應性非平衡磁控濺鍍於 SKH51 高速鋼表面上濺鍍 Cr-C-N 薄膜，主要是要 探討靶電流對 Cr-C-N 薄膜機械性質之影響。實驗固定參數為乙炔流量 40% 、氬氣25sccm 、基 板偏壓 75V 、基板頻率75KHz 、工作距離9cm 、基材轉速9rpm 、離子轟擊電壓400V 。改變靶 電流參數由 5A 逐漸降至 1A。Cr-C-N 薄膜之晶體結構及顯微組織是 由 XRD 、TEM 及拉曼分析。 薄膜之摩擦係數及磨耗率是由 ball-on-disk 磨耗實驗量測 。實驗結果顯示，薄膜之摩擦係數與 磨耗率會隨靶材電流之增加而增加。在靶電流 3A 以上時，薄膜結構為 Cr23C6+Cr7C3 ，摩擦係 數介於 0.5~0.6 之間，随著靶電流降低至 2A 以下時，薄膜轉變為非晶質 DLC 結構嵌入碳化物 CrC ，摩擦係數由0.5 降至 0.26 。磨耗率則由 1.67 E-05 mm3 ‧N-1 ‧m-1 降至 4.17E-06 mm3 ‧N- 1 ‧ -1 m 。 關鍵字:DLC 、CrC 、非晶質 英文摘要 In this study, the Cr-C-N films are deposited on high speed tool steel(SKH51) by the reactive unbalanced magnetron sputtering process .This paper is aimed to investigate the effects of target current on the mechanical properties of Cr-C-N coatings. The crystal and microstructures of Cr-C-N films were examined by XRD,TEM and Ramen and the wear properties were tested by ball-on-disk. The experimental results show that the friction coefficient and wear rate of Cr-C-N films were increased with increasing target current. At target current bigger than 3A, the crystal structure was identified as Cr C +Cr C phase and the friction coefficient and wear rate of films were tested 23 6 7 3 between 0.5~0.6 and 1.67 E-05 mm3 ‧N-1 ‧m-1 respectively. At target current 2A, the crystal structure was identified to be CrC imbedded in DLC and the friction coefficient of films decrease to 0.26 and the wear rate is reduced from 1.67 E-05 mm3 ‧N-1 ‧m-1 to 4.17E-06 mm3 ‧N-1 ‧m-1 . 、 、 Key word:DLC CrC amorphous 一、 前言 近來二十年來發展的陶瓷薄膜中，鉻系薄膜