石英晶片镀膜频率监控技术研究_赵双琦.pdfVIP

28 　 5 　　　　　　　　 　　　　　　　 　　　　　　　　　　　 2008 9、10 CHINESE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY 437 技术交流 　 ＊ 赵双琦 　刘桂礼　李　东　刘　刚 (　　100085) Film Thickness Monitoring with Quartz Wafer ＊ Zhao Shuangqi , Liu Guili, Li Dong, Liu Gang (Department of Electronics and Inf ormation Engineering, Beijing Institute of Machinery, Beijing 100085, China) 　　Abstract　A novel technique was developed to control the thickness of the films grown on quart wafer,with high ac- curacy, by measuring the frequency of the quart oscilator.Discussions focus on operation principle of the quart microbal- ance, design of the oscillator circuits and the relationship between the variations in the intrinsic frequency of the quart os- cillator and the film thickness.Morcover, the dependence of the film thickness on the variations in the frequency of the film covered quart oscillator was experimentally calibrated.The advantages of the newly-developed technique over the conventional ones were discussed.Experimental results show that high accuracy of the oscillation frequency can be well- controlled and so was the film thickness. 　　Keywords　Quart crystal wafer,Plating, Frequency monitoring 　, 。 　　 , , 。, 。 , , 。 , , , 。 　　　 :TN98　　　:A　　　:1672-7126(2008)05-437-04 　　() 。 、, , , , 、、、、、 , , 。 () , 。 。 , (), ( 。, , [1-4] ) , 。 :2007-09-12 :(No.) ＊:Tel:(010Email::haoshq.6284 @ 438 　　　　　　　　 28 1