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1X Broadband Wafer Stepper for Bump and (1 x宽带晶片为肿块和步进)
Pan Pacific 2000
1X Broadband Wafer Stepper for Bump and Wafer Level Chip Scale
Packaging (CSP) Applications
Doug Anberg, Mitch Eguchi, Takahiro Momobayashi
Ultratech Stepper, Inc.
San Jose, California
Takeshi Wakabayashi, Tsutomu Miyamoto
Casio Computer Co., Ltd.
Tokyo, Japan
1.0 ABSTRACT
In the past, the majority of the lithography processing for bump applications has been performed with contact or
proximity aligners. As 8-inch bump and wafer level chip scale packaging (CSP) becomes the driving factor in flip
chip applications, packaging facilities are now demanding a more automated, lower defect, and higher reliability
lithography tool for these processes and thus are utilizing front-end stepper technology
This paper describes the performance of a unique new stepper, the Saturn Spectrum 3 Wafer Stepper, which
employs a 1X 100nm broadband projection optical system developed in collaboration between Ultratech Stepper
and Casio Computer Ltd. specifically for bump and wafer level CSP lithography applications. The optical
characteristics of the unique g, h, and i-line projection exposure system will be discussed along with the overall
technical system capabilities that provide solutions to the unique bump lithography challenges.
Improvement of the image quality and overlay accuracy in comparison to the traditional lithography tool
showing a more robust solution on bump and wafer level CSP applications a
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