ALD原子层沉积技术的应用.pptVIP

NANO-MASTER, INC. 总结 ALD technology was developed over 30 years ago, and it has been used for the industrial production of TFEL displays for more than 20 years. Since the semiconductor industry adapted ALD as a mainstream technology during the past few years, ALD has become clearly visible and now ALD technology is being developed and adapted for a large number of other industrial applications, ranging from nanotechnology coatings on particles to large-area coatings for photovoltaic applications. At the same time ALD material and process research continues actively throughout the world, providing new capabilities for the industry. NANO-MASTER, INC. NANO-MASTER ALD 原子层沉积应用 吴运祥 2017年7月26日 NANO-MASTER, INC. 概述 The main industrial application of ALD is in the manufacture of semiconductor devices, both memory devices and microprocessors. TFEL displays have been manufactured for over 20 years using ALD technology. The read heads of hard disk drives are enabled by ALD. The silver jewelry industry has selected ALD coatings as a way of preventing tarnishing of silver products. In addition to its established industrial uses, ALD is being investigated for a large number of other production applications. NANO-MASTER, INC. 显示屏 ALD technology was developed initially to enable TFEL display production. Production started in Finland in the mid-1980s and several million TFEL displays have been produced to date. In addition to the active dielectric–phosphor–dielectric stack (Below Figure), ALD technology is used to deposit a pinhole-free ion barrier layer on a soda lime glass substrate and as a passivation layer on top of the device structure. Production is based on ef?cient batch-mode ALD systems. NANO-MASTER, INC. 显示屏 Figure：薄膜电致发光(TFEL)显示屏 NANO-MASTER, INC. 显示屏 Since the end of 1990s, ALD technology has been used in Japan by Denso Corporation to produce transparent TFEL displays for automotive and other applications (Below Figure). The hi