化学气相输运沉积单晶钨涂层.PDFVIP

鍖栧姘旂浉杈撹繍娌夌Н鍗曟櫠閽ㄦ秱灞 鍖椾含鐞嗗伐澶у 鍙蹭匠搴嗭紝娌堣壋娉 (1: 鍖椾含鐞嗗伐澶у鏉愭枡瀛﹂櫌锛屽寳浜競100081锛 2: 涓浗鑸ぉ绯荤粺绉戝涓庡伐绋嬬爺绌堕櫌锛屽寳浜競 100048锛? 锛堜簬2016.12 鍙戣〃浜嶮aterials Characterizations 锛 璋垚鏂 鏁欐巿 浜庢檽涓 鍓暀鎺 涓枃鎽樿锛氶挩鍗曟櫠鍏锋湁璁稿浼樺紓鐨勬€ц兘锛岃濡傞珮鐔旂偣銆侀珮锠曞彉寮哄害绛夈€傚寲瀛︽皵鐩歌緭杩愭矇绉?chemical vapor transportation deposition, CVTD)鏄竴绉嶅埗澶囧ぇ灏哄W 鍗曟櫠娑傚眰鐨勬湁鏁堟柟娉曘€傚湪鏈爺绌朵腑锛屼互WCl6 浣滀负杈撹繍浠嬭川锛屽皢W 鍗曟櫠娑傚眰娌夌Н鍦 杞村悜涓裹111 鐨勫崟鏅 Mo 鍩轰綋琛ㄩ潰銆備娇鐢ㄦ壂鎻忕數瀛愭樉寰暅(scanning electron microscope, SEM)鍜岃儗鏁ｅ皠鐢靛瓙琛嶅皠(electron backscattered diffraction, EBSD)鎶€鏈爺绌朵簡娑傚眰鐨勫井瑙傜粨鏋勶紝缁撴灉琛ㄦ槑锛氭矇绉殑W 娑傚眰澶栧舰涓哄叚妫辨煴锛涙秱灞傚眬閮ㄥ瓨鍦ㄥ紓甯哥敓 闀跨幇璞★紝璇ュ紓甯哥敓闀垮彲鑳界敱Mo 鍩轰綋鐨勭己闄峰紩璧凤紝瀵艰嚧鍙栧悜宸紓鐢氳嚦鍦ㄦ秱灞備腑褰㈡垚鏅剁晫锛涙澶栵紝閫氳繃铓€鍧戞硶鍜屽悓姝ヨ緪灏刋 灏 6 7 2 绾胯灏勬祴瀹氬崟鏅堕挩娑傚眰鐨勪綅閿欏瘑搴︾害涓 10 銆?0 涓? cm 锛屼笖闅忕潃娌夌Н娓╁害鍗囬珮锛屼綅閿欏瘑搴﹂檷浣庯紝鍦?300鈩冧互涓婃俯搴︽矇绉殑 鏍峰搧涓婃病鏈夊彂鐜颁簹鏅剁晫銆 鑻辨枃鎽樿锛歍he tungsten single crystal has many excellent properties. Chemical vapor transportation deposition (CVTD) is a possible approach to achieve large-sized W single crystals for high-temperature application such as the cathode of a thermionic energy converter. In this work, CVTD W coatings were deposited on the monocrystalline molybdenum substrate using WCl6 as a transport medium. The microstructures of the coatings were investigated by a scanning electron microscope (SEM) and electron backscatter diffraction (EBSD). The as-deposited coatings are hexagonal prisms. A dislocation density of 106 to 107 counts/cm2 was revealed by an etch-pit method and the synchrotron X-ray diffraction. As the depositing temperature rises, the dislocation density decreases, and no sub-boundaries are found on samples deposited over 1300掳C, as a result of the atom diffusion and the dis