Ti掺杂DLC薄膜的制备及其摩擦学性能研讨.pdfVIP

‘2006全国摩擦学学术会议——纪念摩擦学40周年 Ti掺杂DLC薄膜的制备及其摩擦学性能研究 2 王鹏1 陈友明12张广安3刘维民1张俊彦1 体与金属材料研究所甘肃兰州730000) ’ 用Ram鳓光谱、XPS和TEM对薄膜组成及其结构进行了分析，利用纳米压入对薄膜力学性能进行了研究。结果表明：制 备的西掺杂DI-C薄膜，具有典型的含氢类金刚石薄膜的特征；薄暌表面均匀致密；CI-14气体流量小于40Sccm时，薄膜中 值，最高的硬度，对应其减摩抗磨效果最好。 关键词：类金刚石碳膜币掺杂结构摩擦学性能 and of DLCfilms FCVA PreparingtribologyTi-doped depositedby diamond4ike were onstainlesssteelsubstratesa Abstract：15-dopedhydrogenated carbon∞LC)filmsdeposited by Arand asthe filteredcathodicvacul．1ln method CH4 feedstock．neeffectsofthemethaneflowlate arc(FCVAlusing the bias onthecNaracterizationoftheDLC Resultshowthatthe and negativevoltage films、^，e把investigateI：L surface rate and ratedecreaseswith methaneflow or bias tothe roughnessdeposition increasing neggttivevoltageapplied thefilmsnot Raman substrate．Ramanresultsshowthat did show formethaneflowratebelow spectroscopy scattering contentincreasedwith flowrate andreachedthemaxjmumvalueat 40sc碱andsp3 methane increasing the100sccm nowrateasbias maintainedataconstant-150V．As bias methane andmaintained voltage negativevoltageehm萝ng methaneflowrateat contentreachedthemaximumvalueat-150bias whichit 100sccm,thesp3 voltage,after witll of decreasedandmore bondsfeature fritterincreasethe bias the graphite-like produce