改性光刻胶制备纳米压印模版!.pdf

See discussions, stats, and author profiles for this publication at: /publication/278670714 Molds for nanoimprinting made by modified photoresist Article in cta Physica Sinica -Chinese Edition- · December 2006 DOI: 10.7498/aps.55.6511 CIT TIONS RE DS 2 15 4 authors, including: Yanfeng Guo Xianlin Guo Shanghai Tech University, Shanghai, China 15 PUBLIC TIONS 1,288 CIT TIONS 75 PUBLIC TIONS 916 CIT TIONS SEE PROFILE SEE PROFILE Tang Weihua Beijing University of Posts and Telecommuni… 29 PUBLIC TIONS , 19 CIT TIONS SEE PROFILE Some of the authors of this publication are also working on these related projects: taxonomic View project Hybrid structures of Ga2O3 and 2D materials for new optoelectronics devices View project ll content following this page was uploaded by Tang Weihua on 18 June 2015. The user has requested enhancement of the downloaded file. 第 卷 第 期 年 月 物 理 学 报 (( ! %%) ! ， ， ， WH2 *(( VH * ! AI;I/LIC %%) （ ） !%%%.#P%D%%)D(( ! D)(!!.%’ GQRG ESTU?QG U?V?QG !%%) Q416 * E4:K * UH; * 改性光刻胶制备纳米压印模版! ）） ） ） ）） ! ! ! ! # $ 陈雷明 郭艳峰 郭 熹 唐为华 !）（中国科学院物理研究所北京凝聚态物理国家实验室，北京 !%%%% ）