Vector Raptor Overlay Analysis for Double Patterning amp; Beyond双重图形和矢量猛禽叠加分析；超越.pptVIP

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2018-04-17 发布于江西
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Vector Raptor Overlay Analysis for Double Patterning amp; Beyond双重图形和矢量猛禽叠加分析；超越.ppt

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VectorRaptorOverlayAnalysisforDoublePatterningamp;amp;Beyond双重图形和矢量猛禽叠加分析；超越.ppt

Vector RaptorOverlay Analysis for Double Patterning Beyond Preview Presentation of basic features applications User-customized models Drill-down graphics Precision Analysis Covariance Analysis Five levels of manual automated data culling Multi-layer, Multi-variable lot analysis Engineering Analyses can be “one-click” automated using Weir Daily Monitor Scripts Remote program automation calling Vector Raptor Advanced Overlay Analysis Modeling Model raw data for each structure separately Remove outliers by using the model Use at most a second order polynomial? Use 3 sigma or the range from the population median as a control threshold Agenda Interface Overview Spatial model generation graphics “What-if” scenario Graph generation using mouse selection Vector Raptor Excel Workbook Data Storage Data Storage Organization Example Reports Interactive graph customization Radial Wafer Analysis Radial Culling Multi-Pattern Lot Splits (Families) Results by family Reports mouse generated graphics Model Editor Concept Vector Raptor; Classic Overlay Modeling Employs all classic models for stepper scanners WITH additional sophistication in: Graphics control Analysis Portability Results reporting Ability to apply models to whole field, row (reticle scan response) and column (scan-slit response) Advanced Features Proprietary modeling engine using adaptive model elements and singular value decomposition Models adaptive to both singularities and fit-culling Multi-level, automate and manual methods for data culling Multi-Family Analysis For true overlay-structure and pattern-split analysis Error Source Discrimination Ability to resolve error sources from between: Process Wafer-chuck Field Reticle Scan Lens Slit Poly DP Solution Double Patterning Concepts “Double Patterning” Actually adds multiple alignment and process levels for each split Mask Critical Overall mask registration errors will be critical: Alignment accuracy to scanner registration marks for the layer Overal