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Home Search Collections Journals About Contact us My IOPscience Self-consistent kinetic model of low-pressure - flowing discharges: II. Surface processes and densities of N, H, species This article has been downloaded from IOPscience. Please scroll down to see the full text article. 1998 Plasma Sources Sci. Technol. 7 379 (/0963-0252/7/3/016) View the table of contents for this issue, or go to the journal homepage for more Download details: IP Address: 25 The article was downloaded on 15/09/2010 at 03:21 Please note that terms and conditions apply. Plasma Sources Sci. Technol. 7 (1998) 379–388. Printed in the UK PII: S0963-0252(98)95104-0 Self-consistent kinetic model of low-pressure N2–H2 flowing discharges: II. Surface processes and densities of N, H, NH3 species B Gordiets, C M Ferreira, M J Pinheiro and A Ricard ´ Centro de Fısica de Plasmas, Instituto Superior Tecnico, 1096 Lisboa Codex, ´ Portugal ´ ´ CPAT, Universite Paul Sabatier, 31062 Toulouse Cedex, France Received 3 February 1998, in final form 27 May 1998 Abstract. This work is the second of two companion papers devoted to the kinetic modelling of low-pressure DC flowing discharges in N2–H2 mixtures. While the first paper was mainly concerned with bulk discharge processes, the present one investigates surface processes involving dissociated N and H atoms, which are essential to understand the discharge properties. The kinetic model for surface processes developed here takes into account: (a) physical adsorption and desorption of N and H atoms; (b) chemical adsorption and desorption of both types of atoms at vaca