非平衡磁控溅射技术制备用于红外减反射的无氢碳膜_英文.docVIP

------------------------------------------------------------------------------------------------ —————————————————————————————————————— 非平衡磁控溅射技术制备用于红外减反射的无氢碳膜_英文_ 第25卷 第6期Vol125 No16 ArticleID:167322812(2007)0620850204材 料 科 学 与 工 程 学 报JournalofMaterialsScienceamp;Engineering总第110期Dec.2007 Hydrogen2freeCarbonFilmsbyUnbalancedMagnetron SputteringforInfraredAnti2reflectionCoatings XUJun2qi,FANHui2qing,LIUWei2guo,HANGLing2xia1,2122 (1.StateKeyLaboratoryofSolidificationProcessing,SchoolofMaterialsScienceandEngineering, NorthwesternPolytechnicalUniversity,Xi.an710072,China;2.SchoolofOpto2electronic Engineering,Xi.anTechnologicalUniversity,Xi.an710032,China) =Abstractgt; Thehydrogen2freediamond2likecarbon(DLC)filmsarepotentialmaterialstobeusedasinfraredanti2reflectionprotectivecoatingsiftheiropticalabsorptioncanbereducedtogetrelativelythickfilmsneeded.Inthisstudy,hydrogen2freeDLCfilmsweredepositedinanunbalancedmagnetronsputtering(UBMS)system.Theresultsoffilmthicknessuniformityshowedthatthissystemiscapableofdepositinguniformfilmslargerthan150mmindiameter.TheinfraredtransmissionspectraofDLCfilmsindicatingthattransparentfilmswereobtainedintheinfraredregionforthesinglesideDLCcoatedonthesiliconandgermaniumsubstrates,andabout68.83%and63.05%transmittancewereachievedrespectivelyatthewavenumberof2983Pcm,closetotheoreticalvaluefornon2absorptioncarbonmaterial.Noobviousabsorptionpeakswerefoundbetween5000and800Pcm.Theseexcellentcharacteristicsshowthatthehydrogen2freeDLCfilmspreparedintheUBMSsystemweresuitableforinfraredtransmissionenhancementapplications. =Keywordsgt; diamond2likecarbonfilms(DLC);unbalancedmagnetronsputtering(UBMS);thicknessuniformity;physicalvapordeposition(PVD) CLCnumber:O484.4 DocumentCode:A 非平衡磁控溅射技术制备用于红外减反射的无氢碳膜 徐均琪,樊慧庆,刘卫国,杭凌侠1,2122 (1.西北工业大学材料学院,凝固技术国家重点实验室,陕西西安 710072; 2.西安工业大学光电工程学院,陕西西安 710032) =摘 要gt; 红外减反射保护膜具有特定的厚度要求,如能进一步减小无氢类金刚石膜(DLC)的光学吸收,就能使其在较大厚度时不过分损失光通量而得以广泛应用。从这点来讲,无氢类金刚石膜是一种极具开发潜