Nanoparticle bombardment- deposition纳米微粒轰击沉积.pptVIP

Nanoparticle bombardment-deposition- Inkyu Eu Univ.of Michigan Ann Arbor Mechanical Engineering Overview 1.Second application of NanoFET 2.What is the CBD? 3.How can nanoparticles be deposited on a substrate? 4. Cluster sources 5.How to get nanoparticles’ formation? 6.Future work 1.Second application of NanoFET 2.What is the CBD? Cluster Beam Deposition Method that deposits nanoparticles as a type of cluster on substrate High degree of purity and exact nanoparticle size control 5.How to get nanoparticles’ formation (method)-  (1)Supersonic beam cluster 1.Nanostructured TiO2 films were grown by depositing clusters produced by a pulsed microplasma cluster source (PMCS), in high vacuum conditions. 2.Particles with different masses have different inertia so that a spatial separation takes place and the particles are deposited in different regions of the collecting surface, called impactor. 3.Oxidation of titanium clusters constituting the films takes place immediately after exposition to the air,due to the high reactivity of titanium and to the high porosity of the cluster-assembled films. Ref. E.Barborini,I.N.Kholmanov(2002) 2.How to get nanoparticles’ formation- (2)Low energy cluster beam deposition 1.XPS, Auger, and EELS spectroscopies confirm that the LECBD technique in UHV allows us to produce nanostructured silicon films with a rather low oxygen contamination. In the deposited size range under consideration in our experiments (below 300 atoms) the general behavior of the film is comparable to amorphous silicon 2.The silicon nanograins are partially connected by their dangling bonds leading to a minimization of their total numbers. In addition, cluster surface reconstructions involving the formation of oddmembered rings is at the origin of dangling bond minimization. Ref.P.Melinon P.Keghelian (1997) The x-ray photoelectron spectroscopy technique (XPS), associated with t