石墨烯薄膜的化学气相沉积法制备及应用分析-preparation and application analysis of graphene films by chemical vapor deposition.docxVIP
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石墨烯薄膜的化学气相沉积法制备及应用分析-preparation and application analysis of graphene films by chemical vapor deposition
法。转移过程中旋涂PMMA的工艺参数为:4wt%PMMA/苯甲醚溶液,初转转速1000r.p.m.,初转时间60s,终转转数2000r.p.m,终转时间120s;电化学转移法能够应用于以镍为代表的生长多层石墨烯的金属基底上,分离时间与电流大小成正比关系。而当电流大于0.1A时,由于生成气泡速率过快极易导致薄膜破裂;自支撑转移法是转移少层石墨烯薄膜的一种简便方法,可以应用于软X射线激光器滤光片用自支撑保护膜及石墨烯基激光锁模器件的制备中。(4)采用层层组装方法可以制备出分层结构完好的石墨烯/Au复合夹层材料,为简化制备石墨烯/金属复合材料开辟了路径。(5)石墨烯薄膜作为功能相能够制备出激光锁模器件。石墨烯锁模器件端面的洁净程度对其锁模效果具有直接影响,而石墨烯薄膜在干燥过程中形成的褶皱则对锁模效果没有直接明显影响。关键词:石墨烯化学气相沉积转移复合材料激光锁模AbstractGraphene,anewnanaomaterialwithspecialstructureandproperties.Duetouniquemechanical,chargecarriers,transmittance,thermalconductivity,graphenehasexpansiveapplicationprospectintransparentconductivefilm,lithiumionbattery,supercapacitor,functionalcomposite.Mechanicalexfoliation,reductionofgrapheneoxide,chemicalvapordeposition,epitaxialgrowtharethepreparationmethodofgraphene.Chemicalvapordepositionisoneofimportantmethodacquirelargeareaandhighqualitygraphenefilms.Inthispaper,weraiseCVDsynthesisofgrapheneusingalcoholatlowhydrogenconcentrationandatmosphericpressure(E-APCVD)withaviewtosafetyandeconomy.Thisresearchcontentmainlyincludes:Focusinsafetyandeconomy,craftprocessandtechnologicalparameterhavebeconfirmbydiscussthetechnologicalconditions.Firstly,equipmenthasbeenrefittedinordertoaccordingwithexperimentrequirements.Graphenefilmswithvaryingthicknesscanbesynthesizedbycontrollingparameter.Raman,scanningelectronmicroscopy(SEM)andtransimissionelectronmicroscopy(TEM)aredevelopedtocharacterizethequilaty,morphology,structureofgraphene.Atlast,experimentsweredesginedtoanalysisthemechanism.Theparameterandprocessofchemicaletchingmethodhasbeenconfirmedfortransfergraphenefilm.Electrochemicaldelaminationisusedtotransferfew-layergrapheneonnickelbythefirsttime.Basedonlong-termexperiments,weraiseamethodnamedself-standingtotransfergraphenewhichhasbeenusedtopreparegraphene/AuandopticalfilterprotectivefilmofsoftX-raylaser.Thepreparationprocessofgraphene/Auconfirmedbasedonself-standingmethod.SEMimageofgraphene/Auwhichusedtoanalysisqualityandstructureobtainfromsamplepreparationwithdifferentmode.Wediscusstheinflu
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