可见光响应光催化剂研究进展-ResearchGate.PDFVIP

See discussions, stats, and author profiles for this publication at: /publication/263846298 Progress in visible light responding photocatalysts Article  in   Progress in Chemistry -Beijing- · July 2004 CITATIONS READS 19 734 4 authors, including: Fudong Liu BASF Corp 76 PUBLICATIONS   2,991 CITATIONS    SEE PROFILE Some of the authors of this publication are also working on these related projects: Three-Way Catalysts for Gasoline Emission Control View project All content following this page was uploaded by Fudong Liu on 12 July 2014. The user has requested enhancement of the downloaded file. 维普资讯 第 l6卷 第 4期 化 学 进 展 V01．16No．4 2004年 7月 PROGRESS IN CHEMISTRY July，2004 可见光响应光催化剂研究进展* 陈崧哲一 张彭义 祝万鹏 刘福东 (清华大学环境科学与S-程系 北京 100084) 摘 要 本文综述 了近年来可见光响应光催化剂的研究进展，从窄禁带半导体开发、表面光敏化和离子 掺杂三个方面，详细探讨了该类光催化剂的构成原理、设计思想、制备方法、目前效果及缺 点，展望了该领域 的研究前景。 关键词 可见光响应光催化剂 半导体 窄禁带半导体 离子掺杂 光敏化 中图分类号：0643．3；0644．1 文献标识码 ：A 文章编号 ：1005—281X(2004)04—0613—07 ProgressinVisibleLightRespondingPhotocatalysts ChenSongzhe’’ ZhangPeng ZhuWanpeng LiuFudong (DepartmentofEnvironmentalScienceandEngineering，TsinghuaUniversity，Beijing100084，China) Abstract Thelatestresearchprogressinvisiblelightresponsiblephotocatalystsisreviewed．Theprinciple，design idea，preparingmethod，effectsandshortcomingsoftheconcemedmaterialsarediscussedindetail． Keywords visiblelightrespondingphotocatalyst；semiconductor；narrow gapsemiconductor；iondoping；photo— sensitization