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6 / 2008 10
ZnO
Electrochemical Deposit ion of Nanoporous ZnO Films and
T heir Photoelectrochemical Performance
1, 2 1 1 1 1, 2
, , , ,
( 1
, 200050; 2 , 1000 9)
1, 2 1 1 1 1, 2
GAN Xiao-yan , LI Xiao-min , GAO Xiang-dong , YU We-i dong , ZHU GE Fu-w ei
( 1 Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050,
China; 2 Graduate University of the Chinese Academy of Sciences, Beijing 1000 9, China)
: Zn( NO ) , IT O ZnO/
3 2
KOH 10~ 20nm ZnO XRD
ZnO , EDS Zn O,
2
, 01 68V, 01 79 mA/ cm , 01 26%
: ZnO; ; ;
: O 8 : A : 1001- 381(2008) 10-006 -0
Abstract: Nanoporous ZnO films w ere fabricated on IT O substrate by a tw o-step solution approach,
w hich involves the electrochemical deposition of nanoporous ZnO/ eosin Y hybrid films and subse-
quently desorption treatment to remove eosin Y molecules. Nanoporous ZnO films w ith grain size of
10-20nm w ere obtained. T he X-ray diffraction pattern show ed that nanoporous ZnO film had a hexa-
gonal w urtzite structure, and the EDS results exhibited that the film w as composed of Zn and O, and
no other elements w as detected. The prototype dye sensitized solar cell device utilizing the nanoporous
film as photoelectrode w as fabricated, exhibiting an open-circuit photovoltage of 01 68 V, a short-cir-
2
cuit photocurrent density of 0179 mA/ cm , and an overall conversation efficiency of 012
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