化学脱钴对硬质合金沉积金 刚石薄膜的影响.docVIP

化学脱钴对硬质合金沉积金刚石薄膜的影响 第 卷第 期 中国有色金属学报 年 月18 6 2008 6Vol.18 No.6The Chinese Journal of Nonferrous Metals Jun. 2008 文章编号:1004-0609200806-1070-12 化学脱钴对硬质合金沉积金刚石薄膜的影响 魏秋平 1,余志明 1,马 莉 2,杨 莉 1,刘王平 3,肖 和 3 1. 中南大学 材料科学与工程学院,长沙 410083; 2. 中南大学 粉末冶金国家重点实验室,长沙 410083; 3. 株洲硬质合金集团,株洲 412000 摘 要:采用 HFCVD 系统,以 CH4和 H2为反应气体,分别在 YG3、YG6、YG10、YG13 硬质合金上沉积了金 刚石薄膜,研究了化学脱钴处理对不同钴含量硬质合金沉积金刚石薄膜的影响。通过对 105 个样品的实验结果进 行统计分析发现,YG3 所得金刚石薄膜样品具有足够结合强度的比例为 89%;而 YG6、YG10 和 YG13 所得样品 的相应值分别为 24%、7%和 0%。相反,YG3、YG6、YG10 和 YG13 所得金刚石薄膜严重破坏的比例分别为 0%、 64%、72%和 79%。研究表明,化学腐蚀脱钴处理能够解决金刚石涂层形核率低的问题,但难以解决高钴硬质合 金的附着性差的问题。 关键词:金刚石薄膜;硬质合金;预处理;附着力 中图分类号:TB 43 文献标识码:A Effects of chemical surface pretreatments on diamond coatings on cemented tungsten carbide substrate WEI Qiu-ping1, YU Zhi-ming1, MA Li2, YANG Li1, LIU Wang-ping3, XIAO He3 1. School of Materials Science and Engineering, Central South University, Changsha 410083, China; 2. Key State Laboratory of Powder Metallurgy, Central South University, Changsha 410083, China; 3. Zhuzhou Cemented Carbide Group Corporation, Zhuzhou 412000, China Abstract: Diamond films were deposited on cemented tungsten carbide substrates of various cobalt content 3%, 6%, 10% and 12% Co by hot filament chemical vapour deposition HFCVD to assess the role of cobalt on the quality and adhesion reliability of diamond coatings. The samples were characterized by X-ray diffractometry XRD, scanning electron microscope SEM in combination with energy dispersive spectrometer EDS. Prior to deposition, the substrates were submitted to surface roughening by Murakami’s etching and to surface binder removal by acid liquor. The adhesion was evaluated by Rockwell indentation tests 60 kg conducted with a Brale indenter and compared with the adhesion of diamond films grown onto WC-3% Co, WC-6% Co, WC-10% Co, and WC-13% Co, which were submitted to similar etching pretreatments and identical deposition conditions. According to the statistic table of adhesion