电化学方法制备单一稀土金属钆薄膜.PDF

37 Electrodeposition of Single Rare Earth Metal Gd Film in Nonaqueous System , , , , , ( , 518 6 ) GONG Xiao- zhong, T ANG Jiao-ning, LI Jun- qin, ZHOU Li, ZHANG Yu, XIN Ya-fei( Shenzhen Key Laboratory of Special Functional M aterials, College of Chemistry and Chemical Engineering, Shenzhen U niversity, Shenzhen 518 6 , Guangdong, China) : , pH Gd X ( EDS) , Gd 93. 56% ; ( SEM) ; X (XRD) , ; X ( XPS) , : ; ; ; ; : O614. 41; T B383 : A : 1 1-4381(2 7) 1- 37- 5 Abstract : T he rare earth metal Gd film on Cu substrate was fabricated by electrodeposition in urea- NaBr-KBr-formamide solution under isolation of oxygen. T he effects of the concentration of GdCl3 and the current density and electrodeposition time and pH on the morphology and Gd content of the deposited film w ere investigated. T he results obtained by XRD, SEM, EDS and XPS show that the deposited film contains metal Gd mainly ( 93. 56% , mass fraction) and a few oxygen. The film is dense, homogenous and smooth w ith silvery w hite colour. T oo low or too high current density leads to dark grey, porous and rough deposited film. The Gd content in the film increases and then decrea- ses as the current density increases. A polyvinyl alcohol film w as deposited on the Gd film for pro- tection of oxidation. Key words: metallic material; rare earth; Gd; nonaqueous system; electrodeposition [ 1] - 2152 ~ ,