附件二 上海交大学报英文版投稿格式示例.doc

PAGE PAGE 4 Surface Micromachined ………………… ZHANG San-fengFoundation item: Keygrant Project of Chinese Ministry of Education (No.0…)* E-mail: sjtuapaper2006@ (张三丰), HUA Foundation item: Keygrant Project of Chinese Ministry of Education (No.0…) * E-mail: sjtuapaper2006@ ( Research Institute of ……………., Shanghai Jiao Tong University, Shanghai 200030, China ) Abstract: For radio frequency applications, miniaturized integrated inductor of high performance is very important. However, miniaturized integrated inductors often suffer from low Q-factor and/or fres ( self-resonant frequency ). In this paper, ……. Key words: solenoid inductor ; RF MEMS ; quality factor ; electroplating Document code: A Introduction To meet requirements in mobile communications and microwave integrated circuits, the passive RF (radio frequency) inductors are used in a variety of important applications. Many results have been reported to improve the performance of microinductors. However,….. In this paper, we proposed a new method for fabricating …. = 1 \* Arabic 1 Fabrication Fig.1 shows a brief description of the fabrication process. …. (e) (f) Substrate Seed layer Photoresist Copper Fig.1. Schematic of the simplified fabrication process. = 2 \* Arabic 2 Results and discussion Fig.2 shows the SEM photograph of a fabricated …. = 3 \* Arabic 3 Conclusion In this work, ….. References [1] C. L. Yung, Weijiang Zeng, Pick Hong Ong, et al. A concise process technology for 3-D suspended radio frequency micro-inductors on silicon substrate[J]. IEEE Electron Device Lett., 2002, 23:700-703. [2] Kazuhisa Itoi, Masakazu Sato, Hiroshi Abe, et al. On-chip high-Q solenoid inductors embedded in WL-CSP [J]. Proceedings of HDP, 2004, pp.105-108. [3] C.S.Lin, Y.K.Fang, S.F.Chen, et al. A deep submicrometer CMOS process compatible high-Q air-gap solenoid inductor with laterally laid structure [J]. IEEE Electron Device Lett., 2005, 26:160-162