《薄膜物理与技术》第6章薄膜生长过程.pptx

GrowthMechanism;6.1薄膜生长过程概述;;成核与生长;薄膜生长基本过程;薄膜生长模式;;低温下薄膜生长过程;高温下YBCO薄膜生长过程;6.2粒子的吸附与扩散;化学吸附与物理吸附;表面扩散;扩散距离;;;diffusingmoleculesmaydesorborbeburied

averagetimebetweenadsorptionandburial:tb=n0/Ji

n0:adsorptionsitedensity(#cm-2),Ji:incidentflux(#cm-2s-1)

desorptionfromchemisorbed

stateafter

maximuminclosetore-evaporationtemperature

bestfilmquality(smoother,lessdefects,morehomogeneous);6.3薄膜成核理论; 成核过程是在相变自由能的推动下自发进行的。

直接从过饱和气相中凝结出球形新相核心，不考虑基片界面的影响。

过程自由能变化为：;;;;3D-nucleation(islands)isusuallyundesirable

mitigationstrategy:changeoneormoreofthejsuchthat

-giislowerformaterialswithsametypeofbonding

-giislowerincaseofchemicalreactivity

Auonglass3D-nucleation

Cronglass 2D-nucleationO-SiSi-Cr/O-Crbondings

AuonCr 2D-nucleation,strongmetallicbonding

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Au/Cr/glass layer-by-layer,wetting

Crisanintermediategluelayer;3-10nmsufficient

(continuouslayer)

Ti:similargoodbondingmaterial;alternativemethodstopreventislandgrowth:

ionbeamirradiationofthesubstratesurface

(breaksbonds,enhancesreactivity,destroys islands

i.e.disturbsequilibrium-ionbeamirradiationis oftenveryeffective)

applyasurfactant

reducesgfmorethangS(wateronglass:drops- soapywateronglass:layers);;;q=0:DG(r*)=0idealwetting,layer-by-layergrowth,nonucleationbarrier

nucleationevenifppV(oxidationofmetalsatverylowoxygenpartialpressure)

q=180o:DG(r*)=max-correspondstobulkhomogeneousnucleation;6.3.3成核速率NucleationRate;adsorbedatomsremainuntildesorptionfor(adatomlifetime)ifatomsaggregateduringctheystayonthesubstrate

Ecishighestatsteps,contaminations,etc.-higherdensityofnuclei

;assumen0s≈n0c:;r*increaseswithTSbecausesupersaturationdecreases

latefilmcoalescence(@highaveragethick