Lith Simulation Review锂离子电池模拟综述-Chris Mack.pdfVIP

PROCEEDINGSOFSPIE

SPIEDigitalL/conference-proceedings-of-spie

Lithographicsimulation:areview

ChrisMack

ChrisA.Mack,Lithographicsimulation:areview,Proc.SPIE4440,

LithographicandMicromachiningTechniquesforOpticalComponent

Fabrication,(9November2001);doi:10.1117/12.448059

Event:InternationalSymposiumonOpticalScienceandTechnology,2001,

SanDiego,CA,UnitedStates

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InvitedPaper

LithographicSimulation:AReview

ChrisA.Mack

KLA-TencorFINLEDivision

Suite301,8834NCapitalofTexasHighway,Austin,TX78759

Abstract

Areviewofthecurrentstateoftheartinopticalandelectronbeamlithographysimulationis

presented.Basicphysicalmodelsaredescribedandexamplesaregiven.Inaddition,rigorous

electromagneticsimulationformasktopographyisshownandtheuseofstatisticalmodelingto

predictfeaturesizedistributionsinmanufacturingisdescribed.Finally,numerousexamplesof

theuseoflithographysimulationanditsimpactonthesemiconductorindustryareoffered.

Keywords:LithographySimulation,OpticalLithography,ElectronBeamLithography,

ElectromagneticFieldSimulation,PROLITH,ProBEAM/3D,ProMAXI2D,ProC