晶圆制造资料0.18um_process_introduction.pdfVIP

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  • 2026-03-17 发布于浙江
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0.18umProcessFlow

Introduction

SMIC

1

0.18umProcessFeatures

✓18LGadopt26Photomask,ifexcludeESDlayer

✓AA/Poly/CT/M1~M5/V1~V5useDUVscanner(13layer)

✓“DARC”CaponCriticallayerandTopM6

✓PolyM1~M5adoptOPC(opticalproximitycorrection)

forline-endshortingislandmissing

✓CompositeSpacer(ONO)

✓PSMmethodapplyonCTlayer

✓Cobaltsalicideprocess

✓LowKIMDlayer(FSG)

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