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Trans. Nonferrous Met. Soc. China 25(2015) 803−810
Microstructure and high temperature oxidation resistance of Si−Y
co-deposition coatings prepared on TiAl alloy by pack cementation process
1,2 2 2
Yong-quan LI , Fa-qin XIE , Xiang-qing WU
1. School of Materials Science and Engineering, Beifang University of Nationalities, Yinchuan 750021, China;
2. School of Aeronautics, Northwestern Polytechnical University, Xi’an 710072, China
Received 31 March 2014; accepted 10 December 2014
Abstract: In order to improve the high temperature oxidation resistance of TiAl alloy, Y modified silicide coatings were prepared by
pack cementation process at 1030, 1080 and 1130 °C, respectively, for 5 h. The microstructures, phase constitutions and oxidation
behavior of these coatings were studied. The results show that the coating prepared by co-depositing Si−Y at 1080 °C for 5 h has a
multiple layer structure: a superficial zone consisting of Al-rich (Ti,Nb) Si and (Ti,Nb) Si , an out layer consisting of (Ti,Nb)Si , a
5 4 5 3 2
middle layer consisting of (Ti,Nb) Si and (Ti,Nb) Si , and a γ-TiAl inner layer. Co-deposition temperature imposes strong influences
5 4 5 3
on the coating structure. The coating prepared by Si−Y co-depositing at 1080 °C for 5 h shows relatively good oxidation resistance at
1000 °C in air, and the oxidation rate constant of the coating is about two orders of magnitude lower than that of the bare TiAl alloy.
Key words: TiAl alloy; Si−Y co-deposition coating;
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