氮化钽薄膜的制备与结构研究.pdfVIP

/ 19989 * Research on Synthesis of Taltanlum Nitride Film and Its Structure () Leng YongxiangHuang NanYang Ping ( ept of Materials Engineering Southwest Jiaotong University. , ) [ ] , TEM XR : ; ( 16nm ) ; , , , , , 2 4000kg/ mm , [ Abstract] T he taltanlum nitride film has been deposited by the reactive magnetron sput- tering. T he microstructure of the film were characterize by XR and T EM techniques.T he re- sults revealed that the multiphase was coexistent in the film and the grain size of the film was small ( about 16nm) . In addition, the preferred orientation was observed, and it changed and de- 2 veloped along the direction where the interplanar spacing was more broad when increasing N par- tial pressure. Synthesized under specific conditions the hardness of the taltanlum nitride film 4000 / 2 . . reached kg mm or above The cause of high hardness of the film was discussed The cause 2 of the preferred orientation changed when increasing N partial pressure was also discussed. Keywords taltanlum nitride film hardness microstructure 1 , 60mm; 710- 3 Pa; , 200 , TaN T a N 2 1 , [ 1, 2] 1 - , Ta N 2 T able 1M anufacturing process of the T a-N film [ 3] 4100kgf/ mm , , Pa , Pa , W , ,