《Effect of grain boundary on electric performance of ZnO nanowire transistor with wraparound gate》.pdfVIP
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10.1007/s11771-011-0795-2
Effectofgrainboundaryonelectricperformanceof
ZnOnanowiretransistorwithwrap-aroundgate
ZHOUYu-ming HEYi-gang
1.SchoolofElectricalEngineering,AnhuiUniversityofTechnology,Maanshan243002,China;
2.CollegeofElectricalandInformationEngineering,HunanUniversity,Changsha410082,China
Abetraet:Anovelgrainboundary(GB)modelcharacterizedwithdifferentanglesandpositionsinthenanowisewassetup.By
meansofdevicesimulator,theeffectsofgrainboundaryangleandlocationontheelectricalperformanceofZnOnanowireFET
(NanowireField-EffectTransistor)withamap-aroundgateconfiguration,wereexplored.Withtheincreaseofthegrainboundary
angle,theelectricalperformancedegradesgradually.Whenagrainboundarywithasmallerangle,suchas5°GB,islocatedcloseto
thesourceordrainelectrode,thegrainboundaryispartiallydepletedbyanelectricfieldpeak,whichleadstothedecreaseofelectron
concentrationandthedegradationoftransistorcharacteristics.Whenthe90° GBislocatedatthecenterofthenanowire,theactionof
theelectricfieldisbalancedout,sotheelectricalperformanceoftransistorisbetterthanthatofthe90°GBlocatedattheother
positions.
ZnOnanowire;field-effecttransistor;grainboundary;electricalperformance
ProjectsupportedbytheNationalNaturalScienceFoundationofChina;ProjectsupportedbytheNationalNatural
ScienceFundsforDistinguishedYoungScholarsofChina
2010-05-06 2010-10-14
万方数据
l010
万方数据
1011
万方数据
44(11):2045-2051.
@@[6] BOLOGNESI A, BERLIOCCHI M, MANENTI M, INOUE S,
FARMAKI
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