WAl双层膜系的纳米压痕实验及有限元仿真.pdf

第28 卷 第 11 期 电 子 元 件 与 材 料 Vol.28 No.11 2009 年 11 月 ELECTRONIC COMPONENTS AND MATERIALS Nov. 2009 研 究 与 试 制 W/Al 双层膜系的纳米压痕实验及有限元仿真 尚帅华，杨 平，李 春 （江苏大学 微纳米科学技术研究中心，江苏 镇江 212013） 摘要: 采用磁控溅射法在 CAT.No.7101 玻璃基底上沉积了 W/Al 双层金属膜，并对其进行纳米压痕实验。利用 非线性有限元法对压痕过程进行仿真，分析了膜基体系的应力分布。结果表明：磁控溅射法制备的薄膜组织均匀、力 学性能好。W/Al 双层金属膜系中的 W 薄膜的弹性模量与硬度平均值分别为 75.433 5 GPa、6.206 GPa ，其值与块状W 材料的相应参数差别较大。仿真曲线与实验结果基本相符，能够反映出膜基体系的力学状态以及应力分布规律。 关键词: 磁控溅射；纳米压痕；力学性能；有限元仿真；应力分布 doi: 10.3969/j.issn.1001-2028.2009.11.017 中图分类号: TN305.92 文献标识码:A 文章编号:1001-2028 （2009 ）11-0060-04 Nano-indentation experiment of W/Al bilayer-film system and its finite element simulation SHANG Shuaihua, YANG Ping, LI Chun (Micro-nano Technology Center, Jiangsu University, Zhenjiang 212013, Jiangsu Province, China) Abstract: W/Al bilayer-metal films were deposited on CAT.NO.7101 glass substrates using the magnetron sputtering method. Nano-indentation test was performed on the observed film samples. The loading and unloading processes of nano-indentation tests were simulated via the non-linear finite element method, and the stress distribution in the film-substrate system was analyzed. The results show that W/Al films fabricated by the magnetron sputtering method exhibit uniform structure and good mechanical properties. The elastic modulus and the mean value of hardness of W film in the W/Al bilayer-metal films are 75.433 5 GPa and 6.206 GPa respectively, which are quite different from the corresponding parameters of bulk W. The simulation curves well agree with the ex