《jp2041229 偶氮苯功能化的聚甲基丙烯酸分子刷的光力学解接枝》.pdfVIP

ARTICLE /JPCB Photomechanical Degrafting of Azo-Functionalized Poly(methacrylic acid) (PMAA) Brushes † † † ‡ ,‡,§ Christian Schuh, Nino Lomadze, J urgen€ Ruhe,€ Alexey Kopyshev, and Svetlana Santer* †Department of Microsystems Engineering (IMTEK), University of Freiburg, 79110 Freiburg, Germany ‡Institute of Advanced Studies (FRIAS), University of Freiburg, 79104 Freiburg, Germany §Institute of Physics and Astronomy, University of Potsdam, 14476 Potsdam, Germany S Supporting Information b ABSTRACT: We report on the preparation and characteriza- tion of photosensitive polymer brushes. The brushes are synthesized through polymer analogous attachment of azo- benzene groups to surface-attached poly(methacrylic acid) (PMAA) chains. The topography of the photosensitive brushes shows a strong reaction upon irradiation with UV light. While homogeneous illumination leaves the polymer topography un- changed, irradiation of the samples with interference patterns with periodically varying light intensity leads to the formation of surface relief gratings (SRG). The height of the stripes of the grating can be controlled by adjusting the irradiation time. The SRG pattern can be erased through solvent treatment when the periodicity of the stripe pattern is less than the length of the fully stretched polymer chains. In the opposite case, photomechanical scission of receding polymer chains is observed during SRG formation, and the inscribed patterns are perman