（英文）溅射原理和应用.ppt

Advanced Magnetron Sputtering Techniques: Principles and Applications Original Ion Plating Ion bombardment can replace the effect of temperature and provide enhanced diffusion (Mattox, 1963) Adhesion Throwing Power Densification Requirements Ion Energy - about 40 eV Ion Current - high 1mA/cm2 Ion Plating Characteristics Practical Ion Plating Systems Evolution ofMagnetron Sputtering Techniques Conventional Magnetron Increased Ion Current Ion Current Characteristics Main Advantages of CFUBMSIP Stability Repeatability Uniformity Low Temperature Flexibility Compounds Alloys Graded Coatings Multi-Layer Coatings Comparison of TiN Coating Properties New CFUBMSIP-Derived Coatings CrTiAlN Dymon-iC (DLC-C:H) Graphit-iC (C/Cr) MoSTTM (MoS2/Ti) CrTiAlN Deposition Process Coating Deposition CFUBMSIP 1 Ti, 1 Al, 2 Cr Ar N2 OEM control loop CrTiAlN Coating Sequence Substrate (AISI M42 grade HSS, 1200 grit finish) 0.2 μm Cr bonding layer 0.3 μm CrTiAlN graded layer 4 μm nanoscale CrTiAlN multilayer, 10nm ?15nm, individual CrN layers ~ 6.0nm MoSTTM Applications Industrial Applications High speed machining Cutting Forming Components EU Patent MoS2/metal composite coatings (0842306) MoSTTM Drawing of Stainless Steel Using MoSTTM Drilling Performance Graphit-iCTM Coating Applications Conclusions Magnetron Sputter Ion Plating (MSIP) Fully established industrial process Closed Field Unbalanced Magnetron Sputter Ion Plating (CFUBMSIP) Increased ionisation ensuring excellent coating properties MSIP is the most flexible PVD technique available Compound coatings Alloy coatings Graded coatings Multilayer coatings MSIP is finding increasing applications for coating tools and components CrTiAlN + MoSTTM Workpiece Material: Alloy Steel EN24 ~363HV Tool: High Speed Steel (1/4” ? drills) Holes: Through (19 mm deep) 3185rpm (63.5m/min) 0.30mm/rev 945mm/min (lubricated: 7.5% oil concentrated water based coolant) Coating Number of Holes CrTiAlN 170 CrTiAlN