步进扫描光刻机硅片台连续扫描时间优化算法.pdfVIP

第 44 卷第 10 期 2008 年 10 月 机械工程学报 Vo l.44 NO.I0 CHINESE JOURNAL OF MECHANICAL ENGINEERING Oct. 2008 DOI: 10.3901lJ岛1E.2008.10.154 步进扫描光刻机硅片台连续扫描时间优化算法* 潘海鸿 1 ， 2 李小清 1 严思杰 1 陈琳 2 周云飞 1 (1.华中科技大学机械科学与工程学院 武汉 430074; 2. 广西大学机械工程学院南宁 530004) 摘要:为减少步进扫描光刻机连续曝光扫描运动的扫描过渡时间(扫描时间和步进时间)，将硅片台扫描方向曝光扫描运动分 解为逻辑步进运动和逻辑扫描运动，提出扫描和步进运动时间重叠的轨迹规划算法(时间重叠算法)处理连续曝光扫描运动。 在不破坏运动约束条件下(恒速运动要求以及速度、加速度边界限制)，根据时间重叠算法重新计算并推导不同扫描运动路径 下连续扫描运动过程的步进和扫描运动转折点。经理论分析和硅片曝光场连续曝光实例计算表明 z 基于时间重叠算法的轨迹 规划可获得时间优化的硅片台连续曝光扫描，比传统扫描方法减少曝光扫描运动过程中的无放率时间，提高步进扫描光刻机 生产率，为步进扫描光刻机工程实践提供理论基础。 关键词z 步进扫描光刻机硅片台连续曝光扫描时间重叠规划多项式运动轨迹 中图分类号2 刊305.7 Time-optimal Algorithms for Continuous Scans of矶、fer Stage of Step-scan Lithography Tool PAN Haihong 1 , 2 LI Xiaoqing 1 YAN Sijie 1 - CHEN Lin 2 ZHOU Yunfei 1 (1. School ofMechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074; 2. College ofMechanical and Engineering, Guangxi University, Nanning 530004) Abstr田t: In order ωreduce the scanning transitional time (including 民anning tirr览 and 如pping 也ne) between con出uous exposure scans ofstep-民an lithography tool in a production 严∞邸，世le exposureωan motion ofthe wa侮r stage in the scanning dirωtion is divided inωtwo parts: 也e logiωI s能p and the logiω1 scan. The time-overlay algorithms are introduced in国~ecωries scheming for wafer 侃ageωpr∞邸也e ∞ntinuous ex归sure 阴。duction. Ac∞rdingωthe a1gorithms 吐le switching points of 也e 10gica1民an and the logiω1 s即叫阳ies of ∞ntinuous 优anmotions 缸e reca1cula也d underdiffi臼回tsc缸mingpa也 ofexpo喝町e fields, which will not violate 也e motion limitations (the requirement of constant velωity during 口，posure scan and the limitati∞.s of acceleration and velocity in logical 民an and logical .step motions).ηle theoretical ana1ysis and actual wafer exposure examples calαlIation show that the time-optimal 叫ectoriωofwafer stage for ∞ntinuous exposure scans are obtained by ilie time-overlay algorithm.s. And the inefficiency time betw阳1 exposures scans schemed by 由e propo.sed