A wide-angle antireflection surface for the.pdfVIP

  1. 1、原创力文档(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。。
  2. 2、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载
  3. 3、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
  4. 4、该文档为VIP文档,如果想要下载,成为VIP会员后,下载免费。
  5. 5、成为VIP后,下载本文档将扣除1次下载权益。下载后,不支持退款、换文档。如有疑问请联系我们
  6. 6、成为VIP后,您将拥有八大权益,权益包括:VIP文档下载权益、阅读免打扰、文档格式转换、高级专利检索、专属身份标志、高级客服、多端互通、版权登记。
  7. 7、VIP文档为合作方或网友上传,每下载1次, 网站将根据用户上传文档的质量评分、类型等,对文档贡献者给予高额补贴、流量扶持。如果你也想贡献VIP文档。上传文档
查看更多
A wide-angle antireflection surface for the

A wide-angle antireflection surface for the visible spectrum This article has been downloaded from IOPscience. Please scroll down to see the full text article. 2009 Nanotechnology 20 375301 (/0957-4484/20/37/375301) Download details: IP Address: 0 The article was downloaded on 14/06/2011 at 09:36 Please note that terms and conditions apply. View the table of contents for this issue, or go to the journal homepage for more Home Search Collections Journals About Contact us My IOPscience IOP PUBLISHING NANOTECHNOLOGY Nanotechnology 20 (2009) 375301 (7pp) doi:10.1088/0957-4484/20/37/375301 A wide-angle antireflection surface for the visible spectrum B Pa?iva?nranta, T Saastamoinen and M Kuittinen Department of Physics and Mathematics, University of Joensuu, PO Box 111, FI–80101 Joensuu, Finland E-mail: birgit.paivanranta@joensuu.fi Received 9 April 2009, in final form 4 August 2009 Published 26 August 2009 Online at /Nano/20/375301 Abstract A surface consisting of periodically arranged nanopyramids producing wide-angle broad-band antireflection properties is presented. The reflectance of silicon dioxide is reduced below 0.45% over the visible spectral range (380–760 nm) for viewing angles from 0? to 40?. The surface is designed by using rigorous diffraction theory and fabricated first in silicon by exploiting its strong crystalline orientation and by using the wet etching process. The structure is transferred from silicon to transparent silicon dioxide by using nano-imprint lithography and proportional reactive ion etching. (Some figures in this article are in colour only in the electronic version) 1. Introduction Antireflective (AR) surfaces are of great interest in many applications and in several research fields, such as in optics and optoelectronics. The usual targets of applications range from military applications to coated displays and windows. AR layers are needed when two adjacent materials have different refractive indices thus leading to unwanted Fresnel refle

文档评论(0)

l215322 + 关注
实名认证
文档贡献者

该用户很懒,什么也没介绍

1亿VIP精品文档

相关文档