Analysis of Cr Atoms Three-Dimensional Deposition Characteristics英文文献资料.docVIP

World Journal of Nano Science and Engineering, 2011, 1, 73-78 doi:10.4236/wjnse.2011.13011 Published Online September 2011 (http://www.SciRP.org/journal/wjnse) Analysis of Cr Atoms Three-Dimensional Deposition Characteristics* Hua-Lei Yang, Wen-Tao Zhang, Jian Yang Department of Electrical Engineering and Automation, Guilin University of Electronic Technology, Guilin, China E-mail: mnvad@163.com Received July 23, 2011; revised August 9, 2011; accepted August 16, 2011 Abstract The semi-classical model is used to simulate the three-dimensional trajectory and deposition distribution of the chromium atoms in the Gaussian laser standing wave field using the Runge-Kutta method, and then the three-dimensional deposition stripes are also given, besides, the effects of atomic beam divergence, chro- matic aberration and spherical aberration on deposition structure are also analyzed. Keywords: Three-Dimensional Analysis, Atom Deposition, Cr Atoms, Gaussian Laser Standing Wave Field 1. Introduction search priorities. Its technical routes are mainly along three directions, and one of it is laser focused atomic deposition for Nanometer-scale structure. In NIST, Mc- Clelland et al. once obtained one-dimensional optical gratings of chromium using laser focused atomic de- position technique, the uncertainty of average pitch of focused atomic deposition process manufacturing stand- ard sample was 0.0049 nm [2]. In February 1998, the average pitch of Cr sample which was fabricated by NIST and deposited on Sapphire was 212.7787 ± 0.0049 nm (The substrate temperature was 29?C) [3]. And then in 2002, the average pitch measured by optical diff- raction was confirmed to be 212.7777 ± 0.0069 nm [4]. This was in good line with the expected pitch 212.7705 ± 0.0049 nm at 22?C [4]. The uncertainty of this average Nanotechnology is one of the fastest growing, most ex- tensively studied, and putting up the