负偏压对低温沉积TiN薄膜表面性能的影响-中国表面工程.PDF

18 5 Vol.18 No.5 2005 10 CHINA SURFACE ENGINEERING October 2005 TiN 1,2 1 (1. 430030; 2. 430063) TiN , TiN/TiN TiN TB747 A 1007−9289(2005)05−0020−04 Effect of Negative Bias Voltage on the Surface Properties of Low Temperature Deposition TiN Films BAI Xiu-qin 1.2, LI Jian 1, (1. Wuhan Research Institute of Materials Protection Wuhan 430030; 2. Reliability Engineering Institute, Wuhan University of Technology, Wuhan 430063, China) Abstract: A series of experiments were conducted to study the effects of negative bias voltage on substrate temperature, surface properties of the film, adhesive strength with the substrate, and tribological properties of the film during the preparation of TiN film using low-temperature magnetic sputtering technology. Experimental results showed that the negative bias voltage exhibits an important influence on the properties of TiN film. The addition of negative bias voltage resulted in a significant increase of substrate temperature, decrease of grain size , increase of hardness, improvement of luster, and increase of adhesive strength. In addition, the negative bias voltage resulted also in a negative influence, that is, the rougher film surface. Accordingly, it showed a great effect on the wear properties of the TiN film. Key words: low temperature; magnetic sputtering; negative bias voltage; TiN film 0 1 TiN LEYBOLD Z400