透明导电氧化物薄膜及其制备方法-材料工程.PDF

59 Development of Fabr icat ion M ethods for T rans parent Conduct ive Oxide T hin Films ( , 541004 WA N G H ua ( Depart ment of Info rmat io n Mat erial Science and Engineering, Guilin U niversit y of Elect ro nic T echnolo gy, Guilin 54 1004 , Guang xi, China : ( T CO , - T CO , T CO , : ; ; ; ; : T N248. 1 : A : 100 1- 4 38 1( 2005 09- 0059- 05 Abstract: T he dev elo pments of t ransparent conduct ive oxide ( T CO met ho ds are described . T opics f o- cused are mag net ron sputt ering, pulsed laser deposit ion, so-l g el, spray pyr olysis and f abr ication o n flex ible substrat e. It is put fo rw ar d that t he fabricat io n met ho ds f or T CO t hin f ilms sho uld be im- prov ed com bined w it h high o pt ical and elect rical propert ies, low fabricat ion temperat ure, low cost and goo d adapt abilit y f or int egrat e cir cuit. Key words: T CO; opt ical and electrical properties; fabrication method; flexible substrate; development tendency ( T ransparent Conduct ive Oxide, , T CO , 3eV , ( 1018 ~ 1021 , , cm- 3 , ( 10- 3 ~ 10- 4 8 # cm , ( 80% ~ 90% ( 70% ) ) ) CdO 1907 Badeker[ 1] , , ; , In, Sb, Zn Cd ( 3. 1eV , SnO2 , , In2 O3 20 50 , ZnO , [ 2] 20 80 Sn2 O : F ( FT O , In2 O3 : Sn ( IT O ZnO : A l ( ZA O