高电流密度TiB2／G阴极泄流式铝电解槽的电解实验.pdfVIP

第l8卷第4期 中国有色金属学报 2008年4月 V_01．18 NO．4 The Chinese Journal of Nonferrous Metals Apr．2008 文章编号：1004—0609(2008)04．0738．07 高电流密度TiB2／G阴极泄流式铝电解槽的电解实验 彭建平，冯乃祥，姜艳丽，王耀武，尤 晶 (东北大学 材料与冶金学院，沈阳 1 lOOO4) 摘 要：详述了泄流式TiB2／G阴极电解槽的制作与电解运行操作。在焦粒焙烧、干法启动后，保持1．54 A／cm2的 高阳极电流密度进行140 h电解实验，平均电流效率为86．5％。实验过程中，TiB2／G层稳定而牢固，其腐蚀脱落速 度为0．4 g他·m2)，能很好地保护阴极基体。利用铝参比电极由瞬时断电技术测得泄流式电解槽的阳极过电压和阴 极过电压，它们与对应的电流密度遵循塔菲尔方程关系，其阳极过电压与工业电解槽相当，而其阴极过电压比工 业电解槽的高0．4 V左右。这可能是由于泄流式电解槽中不存在铝液波动，阴极表面附近的电解质分子比远高于工 业电解槽阴极表面的电解质分子比。 关键词：铝电解：泄流式电解槽；石墨化阴极；TiB2涂层；过电压 中图分类号：TF 821；TF 801．3 文献标识码：A Test of drained aluminum electrolysis cell with TiBz／G graphitized cathode at high current density PENG Jian-ping，FENG Nai—xiang，JIANG Yan-li，WANG Ya~wu,YOU Jing (School ofMaterials and Metallurgy，Northeastern University，Shenyang 1 10004，China) Abstract：The construction and testing of a drained cell with TiB2／G graphitized cathode were described．The coke-bed baking method and a dry start-up technology were adopted．During 140 h of electrolysis the drained cell performed steadily atananodic currentdensityof1．54A／cm2witha current efficiencyof86．5％．AfterelectrolysisitWasfoundthat the TiB2 coating layer shows a low wear rate of0．4 g／Ca’m2)．Moreover,the overvoltage at different current densities is meas~ed with an aluminum reference electrode by an interruption technique in the drained cel1．The results Can be depicted as a fairly straight line in a Tafel plot．The anodic overvoltage in the drained cell is close to the value in industrial cells，while the cathodic overvoltage in the drained cell is about 0．4 V higher than that in industrial cells at around 1 A／em2， duetoa stablemol