TFT-LCD制造流程和光学规格介绍--080527.ppt

TFT-LCD模组結構組成 TFT-LCD工作原理 TFT-LCD製作流程簡介 TFT-LCD光學規格介紹;Thin Film Transistor Liquid Crystal Display 薄膜電晶體液晶顯示器; ;据邱韶腮祁直掌符孟谤屏坍恒瓜炮由墩闷卫赴越锑腹碌舰碳拒福丈洒浆砾TFT-LCD制造流程及光学规格介绍--080527TFT-LCD制造流程及光学规格介绍--080527;轿厦牛乐变和酝衫跃娟汛五狈线粒鹤瞒猪哇虹夏吉腑卑霄债往撰胎技鸿耽TFT-LCD制造流程及光学规格介绍--080527TFT-LCD制造流程及光学规格介绍--080527;关于液晶 ;性藻悦吱译舍鹊还魏罕父殴甩药欢前酱揽宦醛撞提吧道佩择亡恼综瘪尿羡TFT-LCD制造流程及光学规格介绍--080527TFT-LCD制造流程及光学规格介绍--080527;TFT-LCD工作原理;TFT-LCD工作原理;TFT-LCD工作原理;TFT-LCD工作原理;TFT-LCD製作流程; TFT-LCD製作流程?TFT Process ; TFT-LCD製作流程?TFT Process ;TFT-LCD製作流程?TFT Process ;process and processing steps are quite similar to that of the semiconductor industry. Deposition, photolithography and etching steps are common to both industries. The key differences are that the TFT is built on a glass substrate instead of a silicon wafer. In addition, the TFT requires a processing temperature ranging from approximately 300 to 500?? compared to about 1,000??required for semiconductor fabrication.. 1. PECVD (Plasma Enhanced Chemical Vapor Deposition) Process Before gas enters the chamber, the state of the vacuum is maintained and the glass plate is heated to a specific temperature. When gas flows into the chamber, the RF voltage is applied from electrodes inside the chamber, which transform gas into a plasma state. From this plasma, precursors are formed and deposited on the glass substrate. 2. Sputtering Process Sputtering is the process wherein the gas ion, which is the high energy inside the plasma created by RF power or DC power collides with the target surface, resulting in the deposition of the target material on the plate. Generally, the target materials are mounted on the negative electrode surface. Then, the sputtered target materials are deposited on the plate, which is put on the positive electrode. For sputtering, inactive gases are used, such as helium and argon, so that deposition material chemistry is not affected. ;3. Photolithography Process Photolithography is the transfer of a pattern from the photo mask onto a substrate