中阶梯光栅刻划误差要求分析 analysis of the ruling error requirements for echelle grating.pdfVIP

第40 卷第 9 期 光电工程 Vol.40, No.9 2013 年 9 月 Opto-Electronic Engineering Sept, 2013 文章编号：1003-501X(2013)09-0068-08 中阶梯光栅刻划误差要求分析 丁卫涛，黄元申，张大伟，杨海马 ( 上海市现代光学系统重点实验室，教育部光学仪器与系统工程中心； 上海理工大学 光电信息与计算机工程学院，上海 200093 ) 摘要：中阶梯光栅作为高色散和高分辨率光学器件，已经广泛的应用于大型光谱仪器之中。在中阶梯光栅的刻划 过程中，存在刻划误差，这将严重影响光栅衍射性能，最终使得衍射效果产生缺陷。针对此情况，定量分析了中 阶梯光栅的刻划误差对衍射光谱、衍射级次、波前误差、鬼线强度、杂散光强度的影响以及提出了一种从衍射效 率角度分析刻划误差的方法。在满足一定条件下，求得上述因素对应的刻划误差分别为：1 265.8 nm、352 nm、 37 nm、112 nm、3.4 nm。这对光栅刻划时限定刻划机的刻划精度提供了直接和重要的参考。 关键词：刻划误差；误差分析；中阶梯光栅；衍射效率 中图分类号：O439 文献标志码：A doi：10.3969/j.issn.1003-501X.2013.09.012 Analysis of the Ruling Error Requirements for Echelle Grating DING Weitao ，HUANG Yuanshen ，ZHANG Dawei ，YANG Haima ( Shanghai Key Laboratory of Modern Optical System, Optical Instrument and Systems Engineering Center of the Ministry of Education; School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China ) Abstract: Echelle grating is used extensively in spectral instruments owing to its advantages, such as the advanced intrinsic dispersion and resolving power. But while ruling the echelle grating, there may be some periodic components of spacing errors which will seriously affect the performance of grating diffraction and lead to defects of the diffraction effects. In response to this situation, the effect of grating’s line error on diffraction spectrum, diffraction order, wavefront error, the intensity of the rowland ghost lin