doped titanium dioxide films prepared by pulsed laser deposition method掺杂二氧化钛薄膜由脉冲激光沉积方法.pdfVIP

Hindawi Publishing Corporation International Journal of Photoenergy Volume 2012, Article ID 758539, 8 pages doi:10.1155/2012/758539 Research Article Doped Titanium Dioxide Films Prepared by Pulsed Laser Deposition Method Juguang Hu,1 Huabin Tang,1 Xiaodong Lin,1 Zhongkuan Luo,2 Huiqun Cao,2 Qiwen Li,1 Yi Liu,1 Jinghua Long,1 and Pei Wang1 1 College of Physics Science and Technology, Shenzhen University, Guangdong, Shenzhen 518060, China 2 College of Chemistry and Chemical Engineering, Shenzhen University, Guangdong, Shenzhen 518060, China Correspondence should be addressed to Xiaodong Lin, linxd@ Received 28 January 2012; Accepted 2 April 2012 Academic Editor: Baibiao Huang Copyright © 2012 Juguang Hu et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. TiO2 was intensively researched especially for photocatalystic applications. The nitrogen-doped TiO2 films prepared by pulsed laser deposition (PLD) method were reviewed, and some recent new experimental results were also presented in this paper. A new optical transmission method for evaluating the photocatalystic activity was presented. The main results are (1) PLD method is versatile for preparing oxide material or complex component films with excellent controllability and high reproducibility. (2) ◦ ◦ Anatase nitrogen-doped TiO2 films were prepared at room temperature, 200 C, and 400 C by PLD method using novel ceramic target of mixture of TiN and TiO2 . UV/Vis spectra, AFM, Raman spectra, and photocatalystic activity for decomposition of methyl