用扩散理论解释激光选择性催化的原理.pdfVIP

第 11 卷 第 2 期 纳 米 技 术 与 精 密 工 程 Vol. 11 No.2 20 13 年 3 月 Nanotechnology and Precision Engineering Mar. 20 13 An Explanation of the Mechanism for Laser Induced Selective Activation Using Diffusion Theory 1 1 1 2 Zhang Yang ， Hansen Hans N覬rgaard ， Hattel Jesper Henri ， Tang Peter Torben ， 1 1 Nielsen Jakob Skov ， Tutum Cem Celal （1.摇Department of Mechanical Engineering ， Technical University of Denmark ， 2800 Lyngby ， Denmark ； 2. IPU ， 2800 Lyngby ， Denmark ） Abstract ： Laser induced selective activation （LISA ） is a technique for selective plating of polymers. A palladium and tin activation system is used before electroless copper plating. The mechanism of the se鄄 ， lective activation is the main focus of this paper. Due to the porous structure of the LISA surface acti鄄 vation colloids need longer time to be rinsed away than that for a non鄄laser鄄machined surface. It is found in experiments that the rinsing step after the activation has a significant influence on the selec鄄 tivity of the plating. In the present work ， the diffusion theory is used to describe distribution of activa鄄 tion colloid concentration after activation and rinsing ， and it is found that the diffusivity of the activa鄄