Synthesis AZO thin films-材料合成化学课件PPT.pptVIP

Synthesis AZO thin films Properties of AZO films Application of AZO films Methods of preparation LPCVD Preparation process * 1. Properties of AZO films 2. Application of AZO films 3. Methods of preparation Outline ZnO properties Transparence Highly resistive Substrates Optical gain Radiation hardness Excellent piezoelectric Wide direct band gap Al doped AZO Low resistivity High transmittance Nontoxicity Cost effectiveness Solar cells Flat panel displays Energy-saving window Gas sensitive transducer Electromagnetic shielding Gas sensitive transducer Solar cells Application of AZO films Energy-saving window FPD Application of AZO films Text5 Magnetron sputtering PLD Sol-gel process CVD sol Dip coating Isopropyl alcohol Soda lime glass substrate Presursors: Zn(Ac)2·2H2O Al(NO3)3·9H20 Stirred at room temperature for 18h Gel Sol-gel dip coating processⅠ 75 ℃ Dry Heat, then cool Dip coating AZO thin films Anneal Gel For 3 cycles Sol-gel dip coating processⅡ Magnetron sputtering 送入真空室 沉积薄膜 通Ar气 真空退火 样品清洗 性能测试评价 取出样品分析 The flowsheet of Magnetron sputtering magnetron sputtering system pulsed DC power source Magnetron sputtering system Pulsed laser deposition λ(KrF)=248 nm Frequency of the laser = 5 HZ Vacuum : ultrahigh vacuum (10-7 torr) Thickness : typically 100-200 nm The device of PLD Tystar –TYTAN160 TEMPRESS Furnaces for LPCVD substrate: Corning E2K glass(140℃) zinc source: Diethylzinc (DEZ), bubbling, 289 K Al source: trimethyl aluminum (TMA), sweeping over, 273 K oxygen source: H2O vapors carrier gas: Ar flow rate: controlled by the flow rate of Ar total deposition pressure : 170 to 300 mTorr thicknesses: 2.4 μm Self-formation of rough morphology Controled growth rate Growth in high temperature Preferred orientation films grain Dense and uniform film The exact composition of thin-film Advantages