半导体界统计和R应用（可编辑）.doc

半导体界统计和R应用 udy Climb the Mountain Peak of R, Fighting !!! Linear Model for Inline Monitor WAT Uniformity Analysis Mixed Effects Model Example WAT Uniformity Analysis Example Result Other Correlation Analyses Equipment Comparison Interesting Plot 1 Interesting Plot 2 Smooth Spline Usage Split control limit Smooth spline simulates the data for reducing noise EWMA Control Chart The Purpose of EWMA Control Chart: Detect data trend shift ; Reduce SPC X-bar charts excursion false alarm rate. Cluster Analysis Illustrations for Single Wafer Analysis Procedure Interface / Data Preparation Background R Usage at SMIC CD SEM Overlay Macro CD SEM Films Stepper / Track Etch Etcher 5XXX 8XXX ASET-F5 2401 Hitachi Films Dep 2. IC Manufacturing 1. IC Design N-Well P-Well P+ P+ N+ N+ Metal 1 3. Fabricated Wafers WAT FT WS/CP WIP MES, iEMS Wafer start Fab out Continually Defect inspection and review: inspection tool KLA,compass review tool: SEM Leica OM Continually ADI, AEI, CD,etc measurement called metrology MES MET Defect KLARF WIP EQ log data Test data Process data Also reliability, memory bit, QC and other data Reliability Analysis Quality Control Price Time to Market Original Yield Ramp Our Mission: Improved Yield Ramp Yield Analysis Thank you 谢谢 QA 请您提问 Inline analysis objectives Automatically examine ALL metrology items Alarm only significant trends and related equipment Drill Down A B Problem Description: Break WAT parameters variation into lot, wafer die components; Highlight large or increasing variance contributors to better control the manufacturing process. i: lot number 1,2,…a; j: wafer number 1,2,…b; k: site number 1,2,…n. Reference Book : Mixed Effects Models in S and S-Plus. Analysis Method: Mixed Effects Model: three-level nested linear model; Applied areas: agriculture, biology, economics, manufacturing geophysics Using R nlme , lot, wafer die variance components are estimated