基于多层结构超材料的光刻成像质量分析-光学专业论文.docxVIP

Abs Abstract II II Abstract Since the 21st century, surface Plasmon polariton has been a field of rapid development, studies of surface plasmons polariton have been attracted more and more scientists’ interests of research. It can be applicated in many aspects, such as: super resolution imaging, surface plasmon lithography, SPP(surface plasmon ploriton) based antenna, light manipulation and so on. Meanwhile, due to its application, it greatly promotes the development of photonics and lithography. In the field of super resolution imaging, the main development of surface Plasmon polariton is as follows: superlenses, hyperlens, metascreen, superoscillation. Especially in recent years, super resolution imaging system consisting of superlens has been put forward, and it has been demonstrated the possibility of super resolution imaging. These systems either focus the magnetic field of near field into a small point, or can resolve the far field beyond the Abe’s diffraction limit, these systems can be termed as super resolution system. Based on the application of superlens on super resolution imaging, this paper mainly carried out the following research: This paper use the multi-layer metal/dielectric that joined the metal reflector act as the superlens model, using the theory of multilayer superlens study the resolution in the photoresist with metal reflector and without metal reflector, also the strength of light intensity contrast in the resist. After that, the multilayer superlens with metal reflector has been further discussed the resolution and light constrat in the middle thickness of resist in different cases, different grating period, different structure, different resist thickness. For all these cases, this paper gives a detailed analysis and draws a general conclusion. After improving the structure of multilayer of superlens, this paper uses comsol software simulate and analyze S-parameter of the multilayer superlens structure, using S-parameter retrieval method