基片下外加磁场磁控溅射方法的研究-材料物理与化学专业论文.docxVIP

一芦65278基片下外加磁场磁控溅射方法的研究 一芦65278 基片下外加磁场磁控溅射方法的研究 中文提要 提 要 本论文研究了通过外加磁场进行磁控溅射的方法，就是将靶内磁场屏 蔽，在基片下放置磁铁，让来自基片下的磁场发挥磁控作用，这样，磁控 效果不会因靶材性质而受到明显影响。与此同时，沉积薄膜的过程中发生 了明显变化。实验中观察到，在外加磁场的作用下，等离子体放电的辉光 的明亮程度及外貌和靶面自偏压发生了明显变化。进一步对沉积薄膜的测 量表明，薄膜的沉积速率等发生了变化，通过对空间磁场进行模拟计算发 现，由于空间外加的纵向磁场引起了放电空间中以及靶面附近磁场分布的 改变，影响了等离子体中带电粒子的运动并最终导致了上述变化。通过细 致的测量还发现，薄膜在膜面内存在明显的厚度梯度，这应当是沉积粒子 受梯度磁场作用的结果。更重要的是：此时靶面被刻蚀的状态比普通磁控 溅射的要均匀得多，刻蚀深度值是从边缘到中间逐渐增大的，在靶面并没 有出现通常的刻蚀环，因此这种磁控配置大大提高了靶的利用率。 关键词：磁控溅射； 磁场梯度； 磁场模拟； 薄膜 作 者：赵新民 指导教师：狄国庆 基片下辨加磁场磁控溅射方法的研究 基片下辨加磁场磁控溅射方法的研究 英文提爱 Abstract Shielding the magnetic field from the target and placing a magnet below the substrate，a new magnetron sputtering method is achieved．By such these arrangements，we found that it becomes easier even to sputter magnetic target． It is because of the liale influence of the target magnetic character on the magnetic field。Meanwhile，there are some changes in the experimental process compared with RF sputtering without magnetic field．Such variations are found that due to applied magnetic field from the substrate．The aspect and brightness of the glow and the self-bias voltage for the target changes significantly．Further measurements for the deposited films indicate that the appearance and the deposition rate of the films also vary．After we simulate the magnetic field in such case with C program，these variations are owed tO distributed change of magnetic field near the target surface and in the discharging space，which Can influence the motion of charged particles in the plasma obviously．A detailed measurement showed apparent thickness gradient in the film plane，which is interpreted as the result of the motion of particles sputtered from the target in the special-distributed magnetic field． Besides ofthose，the pattern ofthe target is novel aRer the long time’S erosion． There is no erosion ring on its surface，SO we can use this method to improve the utilization rate great